Magnetron sputtering system with 3 sources（in IB building）
This system consists of 3 targets with 4 inch diameter to fabricate thin films of chiral magnet and multilayers showing giant magneto-resistance (GMR) effect.
Specifications
Made by SHIMADZU
3 targets with 100 mm diameter
2 RF power supplies
Base pressure : 3×10-5 Pa
Substrate sputtering system，Substrate water cooling
Substrate rotation for multilayer deposition