Magnetron sputtering system with 6 sources
This system consists of 4 targets with 2 inch diameter to fabricate multilayers made of several materials. In addition, there are 2 targets with 2 inch diameter in the sub-chamber (load-lock chamber) .
Base pressure : 1×10-5 Pa
6 targets with 2 inch diameter (4 targets in main chamber, 2 targets in sub chamber)
1 RF power supply and 2 DC power supplies
Ar ion source for substrate cleaning
Substrate rotation and target shuttering system
Sample load-lock system