Magnetron sputtering system with 5 sources, No. 2 (under construction)
This system consists of 5 sources with 3 inch diameter to fabricated thin films made of various materials. In addition, the system is designed to avoid the effect of negative ions flying in high speed to a sample during the sputtering of an oxidized target.
Specifications
Laboratory made (under construction)
Base pressure : 1×10-7 Pa
5 targets (3 inch dia.)
2 RF power supplies
Substrate sputtering system
Target shuttering system
Sample load-lock system