Magnetron sputtering system with 5 sources, No. 1
This system consists of 4 targets with 3 inch diameter and 1 target with 2 inch to fabricate multilayers with 4 materials.
Specifications
Laboratory made
Base pressure : 1×10-6 Pa
4 targets (3 inch dia.) 1 target (2 inch dia.)
3 RF power supplies
Substrate sputtering system and bias voltage application
Substrate water cooling system
Substrate rotation and target shuttering system for multilayer deposition
Sample load-lock system and sample transfer system to e-beam deposition system and 8 source-magnetron sputtering system without breaking vacuum