Molecular beam epitaxy with 8 sources
Magnetic thin films and superlattices are grown by molecular beam epitaxy (MBE) method. This system has 8 material pockets, 8 electron beam sources, and 2 high-voltage DC power supplies to fabricate samples with a complicated film stack.
Specifications
Made by ANELVA
Base pressure : 1×10-8 Pa
8 pockets for deposition sources
2 high-voltage DC power supplies
RHEED surface analysis system
Substrate heating up to 1000 ˚C
Ar ion source for substrate cleaning
Source shuttering system for multilayer and superlattice depositions
Sample load-lock system and sample transfer system to ECR-SIMS and 8 source-magnetron sputtering system without breaking vacuum