Magnetron sputtering system with 8 sources (in IB building)
This system consists of 8 targets with 2 inch diameter to fabricate samples with complicated film configuration such as tunnel magneto-resistance films and spin-valve films.
Bese pressure：1×10-7 Pa
8 targets (2 inch dia.)
2 RF power supplies
Substrate heating up to 800 ˚C
Ar ion source for substrate cleaning
Sample load-lock system and sample transfer system to e-beam deposition system and 8 source-magnetron sputtering system without breaking vacuum