Electron beam deposition system with 4 sources
The materials are evaporated by an electron beam and deposited on a substrate. The deposition in ultra-high vacuum is possible, enabling to fabricate high-quality films. In addition, it can be used to form electrodes in microfabrication process.
Specifications
Laboratory made
Base pressure : 1×10-7 Pa
4 pockets for deposition sources
Electron beam evaporation, 1 power supply
Liquid nitrogen shroud
Thickness monitor of crystal oscillator type
Source shuttering system for thickness control
Sample load-lock system and sample transfer system to magnetron sputtering systems